IC Fabrication Using Electron-Beam Technology.
Abstract
A program to implement e-beam writing technology for fabrication of microcircuits has been initiated this quarter. The technical and economic impact of electron-beam direct slice printing will be demonstrated on 256-bit bipolar RAMs utilizing an electron-beam machine (EBMIIIA). Earlier this year a new high-speed interface was installed on EBMIII to allow up to 5 micrometers/microsec scan rates and 0.5 micrometers line spacings. This corresponds to a data rate of 10 MHz at 0.5 micrometers spacings and 20 MHz at 0.25 micrometers spacings. The conceptual design of an automatic slice loading system has been completed. This would allow slice loading from standard boats under computer control with no operator intervention. This will reduce total cycle time and reduce system downtime since at present the entire chamber is exposed to the atmosphere during slice loading. The proposed IC for this contract is a single monolithic integrated circuit containing a 256-word by 1-bit fully static random access nondestructive readout memory. The memory if fully decoded requires only 8 address lines to select one of 256 storage locations. An additional line, write enable, is provided to enable the memory to modify the stored data. Separate Data Input and Data Output lines are provided for minimum interaction between input and output functions. Three chip enable lines are provided to simplify the decoding required to achieve the desired system.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1977
- Accession Number
- ADA052432
Entities
People
- Gilbert L. Varnell
- John L. Bartelt
- Richard J. Dexter
- Ronald A. Williamson
- Terry L. Brewer
Organizations
- Texas Instruments