Enhanced Heteroepitaxy

Abstract

In order to determine the feasibility of using submicrometer- dimension surface-relief structures to control the orientation of deposited thin films, a technology for fabricating the required structures is being developed. The technology involves holographic lithography, x-ray lithography, and reactive ion etching. A recently developed process for fabricating polyimide-membrane x- ray-lithography masks with thicknesses ranging from 0.5 to several micrometers, and measurements of distortion in such masks are reported.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Jun 30, 1977
Accession Number
ADA054159

Entities

People

  • Alan L. McWhorter

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Distortion
  • Electron Beam Lithography
  • Epitaxial Growth
  • Etching
  • Fabrication
  • Films
  • Geometry
  • Lithography
  • Manufacturing
  • Materials
  • Measurement
  • Radiation
  • Reactive Ion Etching
  • Soft X Rays
  • Thin Films
  • X Ray Lithography
  • X Rays

Fields of Study

  • Materials science
  • Physics

Readers

  • Optical Physics and Photonics.
  • Semiconductor Device Technology