SUPREM II -- A Program for IC Process Modeling and Simulation.

Abstract

SUPREM II is the second version of the IC process simulation program, SUPREM. Several modifications and refinements relative to SUPREM I (1) have been implemented but the basic program architecture and I/O philosophy has not been altered. The input language syntax remains the same, but various semantic changes have been made mainly to accommodate the new or improved physical models used in SUPREM II. This report consists of three parts. In the main part the physical process models and their numerical implementation in SUPREM II are described. Also, some details of the program and data structure are discussed. The second part contains the SUPREM II operating manual valid at the time of the program release. The last part of the report consists of a set of examples of program usage in multi-step process simulation together with some of the resulting outputs.

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Document Details

Document Type
Technical Report
Publication Date
Jun 01, 1978
Accession Number
ADA058473

Entities

People

  • Dimitri A Antoniadis
  • Robert W. Dutton
  • Stephen E. Hansen

Organizations

  • Stanford University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Band Gaps
  • Chemical Reactions
  • Computational Fluid Dynamics
  • Computational Science
  • Computer Programs
  • Computers
  • Diffusion Coefficient
  • Electronics Laboratories
  • Epitaxial Growth
  • Fabrication
  • Ion Implantation
  • Language
  • Operating Systems
  • Point Defects
  • Semiconductor Manufacturing
  • Simulations
  • Simulators

Readers

  • Computer Science.
  • Integrated Circuit Design and Technology.