Basic Improvements in Substrate InP Material.
Abstract
Extremely high purity polycrystalline InP was prepared from solution, having background carrier concentration of 4 x 10 to the 14th power/cc and mobility at 77 K greater than 90,000. When this material is used for the growth of undoped single crystal it results in N(D)-N(A) = 1 x 10 to the 15th power/cc and mobility = 53,000. Low temperature PL also indicate both materials to be of extremely high purity. Preliminary results indicate that doping of single crystal InP by Sn, Fe and particularly Zn results in improved defect density. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 01, 1978
- Accession Number
- ADA061873
Entities
People
- G. A. Antypas