Soft X-Ray Photoemission and Charge Deposition Near Material Interfaces.
Abstract
The work reported here comes under two distinct headings: soft x-ray photoemission and charge deposition profiles near irradiated material interfaces. The first electron backscatter results using the SXRP code are reported. Good agreement is obtained with measurements for 5 keV electrons incident on Al. The effect of elastic scattering on the photoemission spectrum is analyzed in further detail following the initial observations made in a previous DNA contract. Additional code validation tests plus the good agreement with measurements for backscatter confirm the previous result that scattering significantly effects the photoemission spectrum. A simple technique is presented which relates the inner shell ionization IMFP to the corresponding photoionization cross section. The technique is tested on the K and L shells of Al and gives IMFP's which agree well with more rigorous results. The development of an empirical photoemission code is reported along with spectra and yields for exploding wire sources incident on Al, Au, Ag, and C. Finally charge deposition profiles for several material configurations containing thin foils are obtained with the POEM code and compared with data by Frederickson. In general, good agreement is achieved. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 01, 1978
- Accession Number
- ADA062332
Entities
People
- D. J. Strickland
- Dong Lin
- V. W. Pine
- W. L. Chadsey