Reduction of Reticle Reflectance.
Abstract
The objective of the effort reported here is to minimize the relative reflectance of reticles used in electro-optic guidance systems. Relative reflectance is defined as the ratio of observed reflectance of a surface to that of a perfectly smooth surface of the same material using near normal incident radiation. There are two mechanisms which can be utilized to reduce the relative reflectance: scattering and absorption. The efforts described here were directed toward the development of a technique which emphasized the scattering mechanism. Scattering is dependent upon surface roughness, and in general one may state that the minimum RMS value of roughness to obtain less than 10% relative reflectance should be one-fifth the wavelength of the incident radiation. The objective is then narrowed to the problem of producing a sufficiently rough reticle pattern on a smooth transmitting substrate. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 01, 1975
- Accession Number
- ADA063471
Entities
People
- Henry Blazek
- Robert F Hunt
Organizations
- Naval Air Weapons Station China Lake