Experimental Investigations of XeF2 for Possible Laser Applications.

Abstract

The feasibility of the use of xenon difluoride as the oxidant for an HF or DF chemical laser system was investigated. The basic research that was accomplished to provide information for this study included spectral studies, photodissociation and thermal dissociation of the xenon difluoride. The absorption spectrum of xenon difluoride confirmed the literature result. Attempts to detect radical thermal or photodissociation products via electron spin resonance spectrometry were unsuccessful. Due to these negative results it was concluded that xenon difluoride would not be a good candidate for the oxidant in a chemical laser system. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1978
Accession Number
ADA063872

Entities

People

  • Kenneth E. Siegenthaler
  • Larry P. Davis
  • Ronald E. Channell

Organizations

  • United States Air Force Academy

Tags

Communities of Interest

  • Weapons Technologies

DTIC Thesaurus Topics

  • Absorption
  • Air Force
  • Chemical Lasers
  • Chemical Reactions
  • Dissociation
  • Electron Spin Resonance
  • Energy
  • Fluorine
  • Heat Energy
  • High Resolution
  • Kinetics
  • Laser Applications
  • Lasers
  • Light Sources
  • Photodissociation
  • Physical Properties
  • Quantum Properties

Fields of Study

  • Physics

Readers

  • Molecular Photonics/Laser Physics

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Graphene
  • Microelectronics - Microelectromechanical Systems