Noncoplanar High Power FET.

Abstract

The use of low-doped tubs under the source and drain have significantly reduced the parasitic capacitances of a common-gate noncoplanar power FET structure. Submicron gate lengths were easily achieved with an etch and growth technique. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Oct 27, 1978
Accession Number
ADA063956

Entities

People

  • D. M. Collins
  • R. Sankaran
  • S. B. Hyder
  • S. G. Bandy

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Capacitance
  • Electron Microscopes
  • Energy
  • Fabrication
  • Flow Rate
  • Heat Energy
  • Heat Sinks
  • Materials
  • Metal-Semiconductor Junctions
  • Military Research
  • P-N Junctions
  • Resistance
  • Scanning Electron Microscopes
  • Substrates
  • Surface Energy
  • Temperature Gradients
  • Thermal Resistance

Readers

  • Semiconductor Device Technology