Advanced Archival Memory

Abstract

During this six-month period, work on the Advanced Archival Memory System has been concentrated on an ion-implantation based storage concept. Beam and target systems have been developed in parallel. Also, alternative data storage approaches have continued to be explored, and overall systems applications have been studied to provide guidance regarding the important technical parameters. The high current ion writing station appears feasible, and detailed design and construction were begun. However, the ion implant target bit packing density appears to be limited to 0.25 microns under best conditions, and to about 0.40 microns with presently available ion sources. The system applications study indicated that, if the technical goals of the program are met, this system should have superior price/performance features to all identified competitors.

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Document Details

Document Type
Technical Report
Publication Date
Jul 01, 1978
Accession Number
ADA066298

Entities

People

  • C. G. Kirkpatrick
  • G. E. Possin
  • H. G. Parks
  • K. G. Vosburgh
  • R. C. Raymond

Organizations

  • General Electric

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies
  • Weapons Technologies

DTIC Thesaurus Topics

  • Computer Programs
  • Computers
  • Construction
  • Data Storage Systems
  • Electron Beams
  • Electron Microscopes
  • Fabrication
  • Field Emission
  • High Resolution
  • High Temperature
  • Ion Implantation
  • Low Temperature
  • Magnetic Disks
  • Nuclear Scattering
  • Optical Properties
  • Scanning Electron Microscopes
  • Semiconductors

Readers

  • Parallel and Distributed Computing.
  • Semiconductor Device Technology
  • Software Engineering