Ion Implantation as a New Surface Treatment Technology
Abstract
Ion implantation is a new technique (presently used commercially in the semiconductor industry) for treating the surface of metals that has shown a potential for producing orders of magnitude improvement in wear and corrosion applications. Improvements in the surfaces of optical elements and novel optical components may also be possible through use of the process. The objective of the present study was to assess the value of ion implantation in applications of interest to the Department of Defense and the National Aeronautics and Space Administration. Because the application of ion implantation to metallurgy is very new, little definitive information is available. The general feeling of this committee is that the results reported are promising enough to justify a vigorous pursuit of the knowledge that will permit a full evaluation of the more promising possibilities, and perhaps, a realization of the application of ion implantation to improve components.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1979
- Accession Number
- ADA070379