Growth and Characterization of High Purity Lattice Matched GaInAs on InP,
Abstract
The high mobility of GaInAs allows its potential use as a field effect transistor active layer in either microwave, or high speed logic applications, provided that doping levels can be adequately controlled. Previous studies have identified silicon as the major residual donor in InP(2) and GaAs. Here we report on the highest purity GaInAs produced, by carefully controlling the incorporation of silicon.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 22, 1979
- Accession Number
- ADA071738
Entities
People
- James D. Oliver
- Lester F. Eastman
Organizations
- Cornell University College of Engineering