Effect of Annealing Temperatures on TCR and Resistance Values for DC Sputtered Cr-Si Thin Film Resistors,

Abstract

Thin film high value resistros composed of a silicon chromium mixture were sputter deposited under d.c. conditions in argon on to 99.6$ as-fired alumina substrates. Reported are effects on TCR and resistor values which results from the variation of annealing temperatures. The resistors are for use in th fabrcation of hybrid microcircuiting intended for circuit applications whichinvolve ow power, low noise, digital and linear design requirements. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Apr 11, 1978
Accession Number
ADA072937

Entities

People

  • Hayden Morris
  • Henry Rhodes

Organizations

  • Naval Ordnance Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Circuits
  • Electrical Properties
  • Electronics
  • Fabrication
  • Film Resistors
  • Films
  • Integrated Circuits
  • Low Noise
  • Materials
  • Materials Laboratories
  • Microcircuits
  • Resistance
  • Resistors
  • Temperature Coefficients
  • Thin Film Resistors
  • Thin Films

Fields of Study

  • Physics

Readers

  • Integrated Circuit Design and Technology.
  • Semiconductor Device Technology
  • Surface Engineering/Surface Coating Technology.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene