Room Temperature Synthesis of Pure Si, Si3N4, Si3N4On, and K2SiF by Laser Photochemical Reactions.

Abstract

Using 11 watts/sq cm of 10.764 micron frequency of a CO2 laser line as a source to irradiate 35 torr total pressure of the reactants SiH4 and NF3 in various ratios of partial pressure at room temperatures, Si3N4, pure Si, Si3N4On, K2SiF6, and SiH(x)F(y) have been produced. This represents an energy efficiency well over 200 percent and is a cost-effective method of synthesizing the above materials.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Sep 21, 1979
Accession Number
ADA080608

Entities

People

  • J. A. Merritt
  • L. C. Warren

Organizations

  • United States Army Aviation and Missile Command

Tags

Communities of Interest

  • Advanced Electronics
  • Biomedical
  • Weapons Technologies

DTIC Thesaurus Topics

  • Cameras
  • Carbon Dioxide Lasers
  • Ceramic Materials
  • Chemical Reactions
  • Diffraction
  • Energy Efficiency
  • Films
  • Infrared Spectra
  • Lasers
  • Light Sources
  • Partial Pressure
  • Photochemical Reactions
  • Silicon Compounds
  • Spectra
  • X Ray Film
  • X Rays
  • X-Ray Diffraction

Fields of Study

  • Materials science

Readers

  • Molecular Photonics/Laser Physics
  • Pulsed Power and Plasma Physics.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Lasers