Sputter Deposition of Dielectric Thin Films.

Abstract

THE WORK DESCRIBED HEREIN IS THE OUTGROWTH OF A Phase I study completed in August 1978. The objective of the effort is to develop new, high dielectric strength, high optical quality coatings which may ultimately find application in improving the resolution and signal-to-noise ratio of the Pockels Readout Optical Modulator (PROM). During this phase of the program techniques for rf sputtering SiO2 and Ta2O5 dielectrics and indium tin oxide (ITO) transparent conductors were investigated. These materials were selected as most promising, based on the Phase I study. Test samples were sent to Dr. Armand Tanguay of the University of Southern California for detailed characterization on a parallel program. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Feb 01, 1980
Accession Number
ADA082389

Entities

People

  • Ralph E. Aldrich
  • Salvatore C. Moreno
  • Walter J. Faccenda

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Coatings
  • Conductivity
  • Dielectric Films
  • Dielectric Permittivity
  • Dielectric Properties
  • Dielectric Strength
  • Dielectrics
  • Films
  • High Temperature
  • Materials
  • Measurement
  • Optical Modulators
  • Power Levels
  • Radio Frequency Power
  • Sputtering
  • Temperature Gradients
  • Thin Films

Readers

  • Materials Science and Engineering.
  • Technical Research and Report Writing.
  • Thin Film Deposition Science.