Development of an Electrophoretic Image Display
Abstract
The size of the ion-beam milled control-grid structure was increased to 2.0 in. x 2.6 in. (from 0.75 in. x 0.75 in.); the diameter of the uniform area is 2.7 in. Fabrication techniques for this larger size are being developed. The design of a working display is nearly complete. Using the results of the computer model, the dimensions of the display were chosen. The potential wells will be 30 micrometers x 102 micrometers with 6 micrometers wide walls. The maximum separation between electrodes will be 62 micrometers, and the wells with be 12 micrometers deep. The display will have 16 rows of 32 characters in a 5 x 7 dot matrix font with a resolution of 2 1p/mm. The active area will be 2.22 in. x 1.43. in and contain 32,224 pixels. It was decided to use In2O3 as the material for the grid electrode instead of aluminum; deposition of the In2O3 will begin as soon as the sputtering system is modified.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 01, 1980
- Accession Number
- ADA083490
Entities
People
- Joseph Lalak
- Richard Liebert