Investigation of CNTD Silicon Nitride on Complex Shapes.
Abstract
The project reported on herein represents an attempt to extend the technique of CVD to the efficient, economical, one step coating of complex shapes. A limitation in state of the art CVD processing is that planar of axisymmetric shapes are required if coatings having uniform thickness and consistent properties are desired. It was therefore proposed to design, build and test a deposition chamber in which a complex shape such as a turbine blade or vane could be reproducibly and evenly coated on all surfaces in one operation. The present report describes the rationale for the chamber design, experiments leading to the demonstration of its capabilities, and the characterization of the resulting Si3N4 coatings which were deposited on RBSN turbine vanes. A complete description of the chamber and ancillary equipment is given. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 06, 1980
- Accession Number
- ADA085153
Entities
People
- Robert A. Holzl