Plasma X-Ray Sources for Lithography

Abstract

The X-ray source is an important part of any X-ray lithographic system since its characteristics affect ultimate resolution and throughput. High temperature plasmas can be intense X-ray emitters and may be suitable for lithography. This report defines some general considerations which are helpful in evaluating various plasma sources. In addition, a brief analysis is given of three devices, or systems, used to produce such plasmas: the electron beam- sliding spark, the dense plasma focus and the laser produced plasma.

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Document Details

Document Type
Technical Report
Publication Date
May 12, 1980
Accession Number
ADA085656

Entities

People

  • Nicholas P. Economou

Organizations

  • Massachusetts Institute of Technology

Tags

DTIC Thesaurus Topics

  • Computer Simulations
  • Conversion
  • Corpuscular Radiation
  • Couplings
  • Electron Beams
  • Electron Density
  • Electrons
  • Excimer Lasers
  • Glass Lasers
  • Ionizing Radiation
  • Laser Beams
  • Lasers
  • Lithography
  • Radiation
  • Soft X Rays
  • Spectra
  • X Rays

Fields of Study

  • Physics

Readers

  • Nanofabrication and Microfabrication.
  • Plasma Physics.
  • Theoretical Analysis.

Technology Areas

  • Directed Energy
  • Microelectronics