Investigation of InP Technology.

Abstract

The reaction rate for the synthesis of high-purity InP has been increased to 2.5 cm/day by increasing the reservoir temperatures to 460 C and 1040 C for P and In respectively. Characterization of the material by van der Pauw and photoluminescence measurements indicates the same background carrier concentration as that prepared at lower temperatures and therefore lower rates. Zero dislocation density n(+) S-doped and p(+) Zn-doped InP single crystals can be prepared routinely by LEC. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1980
Accession Number
ADA086012

Entities

People

  • George A. Antypas

Tags

Communities of Interest

  • Advanced Electronics
  • Ground and Sea Platforms

DTIC Thesaurus Topics

  • Air Force Facilities
  • Crystal Growth
  • Crystals
  • Electrical Properties
  • Electrons
  • Energy
  • Epitaxial Growth
  • Excitons
  • Liquid Phase Epitaxy
  • Low Temperature
  • Materials
  • Measurement
  • Mobility
  • Single Crystals
  • Temperature Gradients
  • Transitions
  • X Rays

Fields of Study

  • Materials science

Readers

  • Mathematics or Statistics
  • Semiconductor Device Technology