An Ion Beam Milliprobe for Materials Analysis.

Abstract

An ion beam 'milliprobe' has recently been constructed and tested in the Materials Modification and Analysis Branch and is now being applied to the microanalysis of materials. Singly charged ion beams from the NRL 5-MV Van de Graaff accelerator with energies up to 4 MeV can be utilized. A miniature electrostatic lens in line with a pinhole aperture focuses these ion beams to spot sizes as small as approximately 20 micrometers in diameter (0.8 mil, hence the name 'milliprobe'). The sample is positioned in the millibeam by means of a motorized X-Y translation stage which allows one to conduct computer-controlled two-dimension scans of the sample with one-micrometer steps. The milliprobe has been used in conjunction with conventional ion beam analysis techniques to characterize the near-surface regions of alloys and semiconductor materials when good lateral resolution is a requirement. The use of the milliprobe is briefly illustrated in two current studies: (1) wear reduction in stainless steels by the implantation of nitrogen and (2) surface composition changes induced by the laser annealing of silicon that has been implanted with nitrogen.

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Document Details

Document Type
Technical Report
Publication Date
Mar 21, 1980
Accession Number
ADA086109

Entities

People

  • A. R. Knudson
  • R. D. Willis

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Alpha Particles
  • Charged Particles
  • Detectors
  • Diameters
  • Ion Beams
  • Ion Implantation
  • Ions
  • Materials
  • Measurement
  • Micrometers
  • Nuclear Reactions
  • Optical Properties
  • Semiconductors
  • Spectra
  • Stainless Steel
  • Translations
  • X Rays

Fields of Study

  • Physics

Readers

  • Nanocomposite Materials Science
  • Solar Physics
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Microelectronics