A Study of Secondary Ion Triple Bond Analogues.

Abstract

Diatomic molecular ions isoelectronic with CN have been generated in ion implanted semiconductor materials and analyzed using secondary ion mass spectrometry (SIMS). Negative (IVA-VA) ions containing the VA species from IVA implanted IIIA-VA semiconductors are found to be produced more readily than the IVA ions. The triple bond analogues studied were of the general type (IVA-VA), (IIIA-VIA) (-), (VA-VIA) (+) and (IVA-VIIA). Molecular ion formation mechanisms and the analytical consequences of the results of this study are discussed. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Aug 20, 1980
Accession Number
ADA088423

Entities

People

  • D. T. Hodul
  • G. H. Morrison
  • W. C. Harris

Organizations

  • Cornell University Department of Chemistry and Chemical Biology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Analogs
  • Chemistry
  • Computer Simulations
  • Electrons
  • Implantation
  • Ion Implantation
  • Mass Spectra
  • Mass Spectrometry
  • Materials
  • Materials Science
  • Military Research
  • Momentum Transfer
  • Physics
  • Semiconductors
  • Spectra
  • Spectrometry
  • United States

Fields of Study

  • Materials science

Readers

  • Quantum Chemistry
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics