Ion Implantation Metallurgy.
Abstract
A number of electrochemical studies have been carried out on surface alloys which have been produced by ion implantation (1-6). For the most part these studies have been concerned with realtively low energy implantation (ca.25 KeV), yielding surface alloys in the depth range 50 - 150 angstroms. In an attempt to produce a surface alloy of more uniform composition with depth, extending to a level of at least 500 angstroms, we have carried out Ni-implantation into Type 430 ferritic stainless steel using a multi-implantation technique, at energies higher than are commonly used. We believe this level of implantation depth to be of technological significance as this is nearly two orders of magnitude thicker than most passive films. Reported here are results of structural, compositional and electrochemical analysis of the surface alloys formed. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 01, 1979
- Accession Number
- ADA091629
Entities
People
- C. R. Clayton
- H. Herman
- K. Doss
- N. Avadhany
- S. B. Agarwal
Organizations
- Stony Brook University