New Passivation Methods of GaAs.
Abstract
With the information provided by previous ESCA studies that there is non-oxidized. As in the oxide near the interface, detailed efforts have been undertaken to produce MOS structures without this deficiency. A two step insulator fabrication scheme was used to obtain improved capacitance-voltage characteristics. Other efforts concerned the deposition fo different insulators on GaAs. The passivation of quarternary compound semiconductors was undertaken. Results on the experimental investigation regarding the mechanism of light emission from thin MOS structures are reported. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1980
- Accession Number
- ADA092354
Entities
People
- D. Pavlidis
- E. Huber
- H. Adachi
- H. L. Hartnagel
- S. Hannah