An Ultrasensitive Electron (Soft X-Ray) Silver Halide/Chalcogenide Negative or Positive Inorganic Resist.

Abstract

We have successfully Ag-photodoped As2S3 using photographic Ag derived from evaporated AgBr. The use of evaporated AgBr has resulted in a 1000-fold increase in speed. We have shown that evaporated AgBr has very high sensitivity in the deep UV (50 microJ/sq cm at 2600 Angstroms), at soft x-ray wavelengths (5 microJ/sq cm at 7 Angstrom) and confirmed the previously observed e-beam sensitivity of 10 to the minus 9th power coulombs/sq cm. We have shown the feasibility of using evaporated AgBr as the photon sensitive layer of a multi-year photoresist system for sub-micron lithography. (Author)

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Nov 10, 1980
Accession Number
ADA093450

Entities

People

  • Jerome M. Lavine

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Absorption
  • Chemical Reactions
  • Coefficients
  • Films
  • Grain Size
  • Ion Beams
  • Lithography
  • Low Resolution
  • Materials
  • Military Research
  • Near Field
  • Photographic Materials
  • Photographs
  • Printing
  • Radiation
  • Soft X Rays
  • X Rays

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Nanofabrication and Microfabrication.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene