Graphoepitaxy

Abstract

A new technique for fabricating high-contrast x-ray masks with simple patterns of lines and spaces less than 50 A in width is described. The successful replication of 175-A lines and spaces in polymethyl methacrylate (PMMA) using the carbon K (45-A) x-ray is reported. It was found that PMMA structures smaller than 150 A in width lost their physical integrity and would not adhere to SiO2 substrates.

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Document Details

Document Type
Technical Report
Publication Date
Dec 31, 1979
Accession Number
ADA096064

Entities

People

  • Henry I. Smith

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Contrast
  • Electron Microscopes
  • Electrons
  • Etching
  • Fabrication
  • Films
  • Lithography
  • Materials
  • Methacrylates
  • Microscopes
  • Microscopy
  • Polymethyl Methacrylate
  • Square Waves
  • Substrates
  • Thin Films
  • X Ray Lithography
  • X Rays

Readers

  • Nanofabrication and Microfabrication.
  • Thin Film Deposition Science.

Technology Areas

  • Space