A Study of Flicker Noise in MOSFETs.
Abstract
Temperature fluctuations, i/f and g-r noise has been measured and empirically modeled in thin pyroelectric films, in P-implanted buried-channel and weakly inverted MOSFETs. Number and mobility fluctuation models are being used. Reference is made to papers published or in print. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 01, 1981
- Accession Number
- ADA097557
Entities
People
- A. Van Der Ziel
Organizations
- University of Minnesota