Electronic Processes in InP and Related Compounds.
Abstract
The growth and characterization of high-purity epitaxial layers grown by liquid-phase-epitaxy (LPE) are described. Chemical and electrical evaluation of the layers indicate that silicon and sulfur are the dominant residual donors in LPE-grown InP layers. Techniques for controlling these dopants are discussed. The current-voltage characteristics of Schottky diodes on p-InP are analyzed. Aluminum, silver, and gold were tried as Schottky-barrier metals. The results reported here demonstrate that Al is the best choice as the Schottky metal. An automated system to measure the relative photoresponse from Schottky diodes has been assembled. Majority carrier (hole) initiated avalanche multiplication has been observed on these Schottky diodes. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 01, 1981
- Accession Number
- ADA098349
Entities
People
- C. L. Anderson
- Dawn E. Holmes
- G. S. Kamath
- H. L. Dunlap
- K. V. Vaidyanathan
Organizations
- HRL Laboratories