Photoelectrochemical Depositions of Microscopic Metal Film Patterns on Si and GaAs.

Abstract

Microscopic metal film patterns have been imaged on p-Si and n- and p-GaAs by photoelectrochemical deposition from standard aqueous plating solutions. The photodeposition of Cu, Ni, Pd and Au films was investigated. Resolution exceeding 10 micrometers has been achieved for deposits on Au on p-GaAs and Cu on p-Si. (Author)

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Document Details

Document Type
Technical Report
Publication Date
May 01, 1981
Accession Number
ADA099456

Entities

People

  • Allan D. Darrow Ii
  • R. David Rauh
  • Ronald H. Micheels

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemical Engineering
  • Chemical Synthesis
  • Chemistry
  • Electrodeposition
  • Electrodes
  • Electronics Laboratories
  • Energy Bands
  • Films
  • Materials
  • Materials Science
  • Metal Films
  • Metal-Semiconductor Junctions
  • Military Research
  • N Type Semiconductors
  • New York
  • Photoelectrochemical Cells
  • Semiconductors

Readers

  • Electrochemical Engineering/ Fuel Cell Technologies
  • Semiconductor Device Technology
  • Thin Film Deposition Science.