The Effects of Ion Implantation on Friction and Wear of Metals.

Abstract

The effect of ion implantation on the friction and wear behavior of metals was investigated. Experiments were conducted with iron, titanium, and copper implanted with nitrogen ions, iron implanted with aluminum ions, and copper implanted with zinc ions. The significant reduction in friction and wear of the iron and titanium systems is attributed to a hard layer formed during the ion implantation process. This hard layer minimizes plowing and subsurface deformation and hence reduces the delamination wear process, i.e. crack nucleation, crack propagation, and the formation of delamination wear sheets. A finite element model of an elastic semi-infinite solid under the contact of a stationary rigid asperity showed that the hard layer does not change the subsurface stress distribution by supporting the load, but rather that this thin layer decreases the plowing component of friction. The model predicts that this decrease in the friction coefficient in turn, substantially reduces subsurface deformation and thus wear. The implanted copper specimens which did not appear to have a hard surface layer showed little improvement in their tribological behavior over the unimplanted copper.

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Document Details

Document Type
Technical Report
Publication Date
May 01, 1981
Accession Number
ADA101173

Entities

People

  • Nam P. Suh
  • Sharon R. Shepard

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics
  • Air Platforms
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemical Analysis
  • Crack Propagation
  • Elements
  • Finishes
  • Friction
  • Hardening
  • Materials
  • Mechanical Properties
  • Mechanics
  • Metals
  • Military Research
  • Surface Chemistry
  • Surface Finishing
  • Surface Properties
  • Two Dimensional
  • United States
  • Wear Resistance

Fields of Study

  • Materials science

Readers

  • Materials Science (Mechanical Engineering).
  • Materials Science and Engineering.
  • Semiconductor Device Technology