Numerical Methods for 2-Dimensional Process Modeling

Abstract

The completion and testing of a fast algorithm for the calculation of two-dimensional dopant redistribution during oxide growth is described. A numerical comparison with analytical, exact solutions for low-dose implants is made which shows negligible error.

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Document Details

Document Type
Technical Report
Publication Date
Jul 01, 1981
Accession Number
ADA102847

Entities

People

  • C. D. Maldonado
  • W. D. Murphy
  • W. F. Hall

Tags

Communities of Interest

  • Advanced Electronics
  • Cyber
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Algorithms
  • Boundary Value Problems
  • Coefficients
  • Computational Science
  • Computer Programs
  • Computers
  • Differential Equations
  • Diffusion
  • Diffusion Coefficient
  • Equations
  • Fabrication
  • Integrated Circuits
  • Semiconductor Devices
  • Semiconductors
  • Simulations
  • Simulators
  • Two Dimensional

Readers

  • Computational Fluid Dynamics (CFD)
  • Fluid Dynamics.
  • Materials Science and Engineering.