The Chemical Vapor Deposition of Iridium.

Abstract

The preparation of iridium films for thermionic cathodes by chemical vapor deposition was studied. The deposition from IrCl3/H2/CO atmospheres was very inefficient; however, iridium was deposited from IrF3/H2/CO at 465 C + or - 25 C with reasonable efficiency. The majority of the deposits were porous or loose powders. An attempt to deposit iridium on a substrate designed to produce a microporous film was unsuccessful because of the poor throwing-power of the process. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Jul 01, 1981
Accession Number
ADA104582

Entities

People

  • Daniel L. Haynes
  • David M. Vandenberg
  • John B. Mooney
  • Robert T. Rewick
  • Thomas E. Gray

Organizations

  • SRI International

Tags

Communities of Interest

  • Advanced Electronics
  • Space

DTIC Thesaurus Topics

  • Body Weight
  • Chemical Properties
  • Chemical Vapor Deposition
  • Dielectric Gases
  • Efficiency
  • Electron Microscopy
  • Films
  • Flow Rate
  • Mass Flow
  • Materials
  • Materials Processing
  • Military Research
  • Pressure Regulators
  • Refractory Metals
  • Substrates
  • Vapor Deposition
  • X Rays

Fields of Study

  • Materials science

Readers

  • Applied Combinatorial Optimization and Logic Circuit Design.
  • Electrochemical Engineering/ Fuel Cell Technologies