Chemical Removal of Optical Coatings.

Abstract

Thin-film optical coatings are normally removed by polishing to reclaim valuable substrates. Selective chemical reaction can replace the polishing process for the removal of metallic and dielectric coatings. A unique advantage of chemical removal is the selectivity. Certain layers of an optical coating design can be removed while leaving the remaining layers intact. Selectivity is virtually impossible with a polishing process since the polishing compound is usually harder than the coatings. Optical coatings of gold, silver, chromium, thorium fluoride and zinc selenide were removed from substrates of molybdenum, titanium-zirconium-molybdenum alloy, germanium and silicon. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1979
Accession Number
ADA105395

Entities

People

  • Earl W. Wasson

Organizations

  • Air Force Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Aluminum Oxides
  • Chemical Synthesis
  • Chemistry
  • Compound Semiconductors
  • Dielectrics
  • Germanium Compounds
  • Governments
  • Hydrochloric Acid
  • Hydrogen
  • Materials
  • Materials Science
  • Measurement
  • Optical Coatings
  • Oxides
  • Test Equipment
  • Visual Inspection

Fields of Study

  • Materials science

Readers

  • Educational Psychology
  • Surface Engineering/Surface Coating Technology.
  • Thin Film Deposition Science.