X-ray Scattering Investigation of Microalloying and Defect Structure in Ion Implanted Copper.

Abstract

The double-crystal method for x-ray scattering analysis of radiation has been applied to the investigation of aluminum implanted copper. The interpretation of x-ray observations is based on effects of lattice strain in the surface microalloy and the presence of dislocation loops which originate from implantation damage. The copper crystal with a dislocation less than 1000 cm/cu cm was implanted with aluminum to a dose of 2 x 10 to the 16th power ions/cm with energies up to 200 keV. The response of the implanted crystal to annealing at 500 C and 600 C was determined. The quantitative use of the x-ray technique to assess implantation effects and the limitations of the technique are discussed.

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Document Details

Document Type
Technical Report
Publication Date
Aug 26, 1981
Accession Number
ADA105442

Entities

People

  • S. Spooner

Organizations

  • Georgia Tech

Tags

Communities of Interest

  • Air Platforms
  • Energy and Power Technologies
  • Space
  • Weapons Technologies

DTIC Thesaurus Topics

  • Aircrafts
  • Bragg Angle
  • Diffraction
  • Engineered Materials
  • Geography
  • Ion Implantation
  • Materials
  • Materials Engineering
  • Materials Science
  • Metals
  • Military Research
  • Observation
  • Physics Laboratories
  • Scattering
  • X Ray Scattering
  • X Rays
  • X-Ray Diffraction

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Semiconductor Device Technology