An Ultrasensitive Electron (Soft X-Ray) Silver Halide/Chalcogenide Negative or Positive Inorganic Resist.

Abstract

We have successfully Ag-photodoped As2S3 using photographic Ag derived from evaporated AgBr. The use of evaporated AgBr has resulted in a 1000-fold increase in speed. We have shown that evaporated AgBr has very high sensitivity in the deep UV (50 microJ/cm2 at 2600 angstrnoms), at soft x-ray wavelengths (5 microJ/cm2 at 7 angstrnoms) and confirmed the previously observed e-beam sensitivity of 10-9 coulombs/cm2. We have shown the feasibility of using evaporated AgBr as the photon sensitive layer of a multi-layer photoresist system for submicron lithography. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1981
Accession Number
ADA109818

Entities

People

  • Jerome M. Lavine

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Band Gaps
  • Corporations
  • Electrical Engineering
  • Electrons
  • Elements
  • Energy Bands
  • Equations
  • Frequency
  • Halides
  • Lithography
  • Materials
  • Radiation
  • Semiconductors
  • Sensitivity
  • Silver Halides
  • Soft X Rays
  • X Rays

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Molecular Genetics
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene