A Contamination Simulation Facility with In-Situ Infrared Analysis Capability
Abstract
A new volatile condensable materials (VCM) facility has been constructured. The facility features a unique in situ Fourier transform infrared spectrophotometric system in addition to a quartz crystal microbalance and quadrupole mass spectrometer. Contaminants can be collected and subjected to infrared spectroscopy at the collection temperature, circumventing problems associated with ex situ infrared measurements. Preliminary results indicate that VCM, with deposition thicknesses less than 200 A, can be identified.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 20, 1982
- Accession Number
- ADA111350
Entities
People
- D. E. Masturzo
- D. J. Carre
- H. R. Hedgpeth
- P. D. Fleischauer
- W. J. Kalinowski
Organizations
- The Aerospace Corporation