Investigation of CNTD SiC on Complex Shapes.

Abstract

The present report describes efforts to develop chemical vapor deposition (CVD) techniques for applying uniform coatings of structural ceramic materials to a complex shape. Both Si3N4 and SiC were used in the program, and the shape chosen to demonstrate the capabilities of the specially designed reactor was an airfoil--in particular a Si3N4 vane and a SiC blade. (Author)

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Nov 01, 1981
Accession Number
ADA112416

Entities

People

  • Jacob J. Stiglich
  • Robert A. Holzl
  • Rodney M. Panos

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Boundary Layer
  • Ceramic Materials
  • Chemical Vapor Deposition
  • Coatings
  • Fluid Dynamics
  • Fluid Flow
  • Gas Flow
  • Government Procurement
  • Governments
  • Materials
  • Materials Laboratories
  • Reynolds Number
  • Silicon Carbide
  • Test And Evaluation
  • Turbine Blades
  • Turbines
  • Turbulent Flow

Fields of Study

  • Materials science

Readers

  • Aerodynamics.
  • Superconducting Magnet Technology
  • Thin Film Deposition Science.