Study of Mechano-Chemical Machining of Ceramics and the Effect on Thin Film Behavior.
Abstract
Efforts were made to finish the surfaces of single-crystal MgO, Si, and both single-crystal and tape-cast Al2O3 using the technique of mechano-chemical polishing. In this technique, the emphasis is on employing an abrasive whose hardness is less than that of the workpiece to produce damage-and scratch-free surfaces that are also flat. An evidence for mechano-chemical polishing in the form of scratch-free surfaces was not obtained in the case of MgO, which was polished using talc, rock salt, calcite, and fluorite as abrasives. The mechano-chemical polishing effects, however, were readily observed when Si was polished using CaCO3, BaCO3, and MgO as abrasives, and when Al2O3 was polished on a plate of window glass using no abrasive. Mechano-chemically-polished surfaces were characterized using RHEED, profilometry, interferometry, optical microscopy, and electron spectroscopy for chemical analysis. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1981
- Accession Number
- ADA112574
Entities
People
- Heli Vora
- R. J. Stokes
Organizations
- Honeywell International, Inc.