A Program of Research on Microfabrication Techniques for VLSI Magnetic Devices.
Abstract
Means of fabricating, selectively modifying, and characterizing single crystal epitaxial garnet and amorphous magnetic thin films films are being investigated with the intention of developing new materials and processes for magnetic devices including bubble, recording, magneto-optic, and microwave devices. Techniques for the routine deposition of these materials have been established and several novel characterization techniques developed. Transmission electron microscopy has been used to investigate structural effects of ion implantation on garnet materials and selected area transmission electron diffraction has been used to study strain profiles at boundaries between implanted and unimplanted garnet material. A magneto-optic photometer system which permits characterization of thin (approx 1000A) layers of magnetic material with resolution on the order of a micrometer has been developed and used to magnetically characterize ion implanted layers of garnet. Optical spectra of ion implanted garnets are being studied to gain information on the stoichiometric and crystal field deviations produced by ion implantation in garnets. Amorphous magnetic materials are being researched in an attempt to replace the more expensive single crystal magnetic garnets. Furthermore, both contiguous-disk and current-access magnetic bubble devices have been fabricated and a novel current-access ion-implanted device demonstrated to require low power dissipation. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 01, 1981
- Accession Number
- ADA117922
Entities
People
- Aidee Guzman
- C. L. Bauer
- J. A. Rayne
- M. H. Kryder
Organizations
- Carnegie Mellon University