Fabrication and Properties of Multilayer Structures

Abstract

This program has as its goal the development of vapor deposition processes for application to integrated circuit technology. Its purpose is to investigate vapor deposition techniques that offer potential for synthesis of materials having new, unique structures and/or of higher quality than currently attainable. Technological application of these materials will be a significant consideration in the selection of specific systems for study. This report focuses on five individual work areas: (1) synthesis of SiO(x), (2) synthesis of SiC, (3) synthesis of Pd2Si, (4) electrical diagnostics of films, and (5) computer simulation of film synthesis.

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1982
Accession Number
ADA120719

Entities

People

  • Colin A. Lee
  • L. Landsberger
  • T. Halicioglu
  • T. W. Barbee Jr.
  • William A. Tiller

Organizations

  • Stanford University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Charge Density
  • Computer Simulations
  • Conduction Bands
  • Crystal Structure
  • Energy Bands
  • Fermi Levels
  • Infrared Detectors
  • Materials
  • Materials Science
  • Measurement
  • Molecular Dynamics
  • Refraction
  • Refractive Index
  • Semiconductors
  • Silicon Carbide
  • Solid State Physics
  • Thin Films

Readers

  • Nanofabrication and Microfabrication.
  • Nanoscale Plasmonic Nanotechnology
  • Systems Analysis and Design