Ion-Beam Deposition of Nb and Ta Refractory Superconducting Films,
Abstract
In this paper we report on the electrical, superconducting, and structural properties of ion-beam deposited Nb and Ta films produced using a Kaufman ion source. We find that after careful optimization of ion gun parameters and the use of Xe gas, this technique is capable of reproducibly depositing high quality superconducting Nb films on room temperature substrates. The deposition conditions are, in fact, less stringent than for e-beam or planar sputtering systems. We also find that by employing a multiple target capability, high quality Ta films can be produced under the same conditions by first depositing a thin underlayer of Nb. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1982
- Accession Number
- ADA123463
Entities
People
- D. E. Prober
- D. W. Face
- S. T. Ruggiero
Organizations
- Yale University