Modification of a Plasma-Therm Inductively Coupled Plasma Supply to Enable RF Power Modulation.
Abstract
A modification to a commercial radio-frequency power supply is outlined which enables the rf output power to be modulated over a broad frequency range (dc to 0.5 MHz). The modified power unit is used to drive an inductively coupled plasma of the kind utilized for elemental analysis. Applications of the modified unit include the study of energy storage and migration in the plasma and the modulation of atomic emission signals from elements present in chemical samples. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 25, 1983
- Accession Number
- ADA126232
Entities
People
- Gary M. Hieftje
- J. W. Carr
- R. E. Ensman
Organizations
- Indiana University