Fabricate Indium-Antimonide Two-Dimensional Charge Injection Device Array.
Abstract
The objective of this program was to fabricate 16x64 two-dimensional InSb CID arrays using the process sequence developed by GE CR&D under contract N00173-80-C-0281. This process sequences does not involve a thick-thin cut back of the pixel gate oxide and therefore produces an essentially planar structure. InSb CID focal plane arrays with 16x64 elements have been fabricated and various 2-D CID modes demonstrated on test structures incorporated on the chips. Low threshold voltages, low density of states in the interfaces and in the gate oxides and dual-gate coupling between row and column gates of less than one volt have led to the demonstration of practical ideal mode behavior. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 01, 1982
- Accession Number
- ADA127638
Entities
People
- C.-y. Wei
- H. H. Woodbury
Organizations
- General Electric