Silicide Formation and Schottky Barrier of Rare-Earth Metals on SI
Abstract
During this period, our activities included the following: Design and construct mechanical masks for Er (and other thin film) depositions; Completion of the construction of a vacuum annealing furnace. The vacuum chamber is pumped by a turbo-molecular pump and is capable of annealing eight 88) different samples sequentially in one pump-down. The normal operating pressures is < 2 x 1- to the -7 torr and the chamber is relatively free from carbon and oxygen contamination; Investigation of annealing Er layers deposited on Si in our new vacuum furnace, and the electronic properties of ErSi2 diodes using mechanical masks, and Acceptance of publication by Applied Physics Letters of our paper entitled Surface Morphology of Erbium Silicides (See Appendix A).
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 30, 1983
- Accession Number
- ADA131748
Entities
People
- S. S. Lau
Organizations
- University of California, San Diego