Electrostatic Plugging of Multidipole Cusps.

Abstract

Electrostatic plugging of multidipole cusps is investigated. The plugging is produced by placing positively biased electrodes on both sides of all magnetic cusps. Experimental observations show the plasma potential follows the electrode potential and the plasma electron density increases by a factor of about two as the electrode bias increases from zero. The addition of a negatively biased grid at one end of the chamber does not change the response of the plasma electron density to the electrode bias. A model, which considers plasma losses along the magnetic cusps as well as by diffusion transverse to the field lines, is shown to qualitatively agree with the data. The elevated interior plasma potential permits the identification and investigation of secondary electron production at the walls. Data is presented which shows that secondary electron emission rate at the chamber walls can be comparable to plasma production rate. A measurement of the relative ion densities of Hydrogen is attempted, but the results are inconclusive as to the effect improved confinement has on the various ion species densities. (Author)

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Document Details

Document Type
Technical Report
Publication Date
May 01, 1982
Accession Number
ADA133621

Entities

People

  • Kyle Hendricks

Organizations

  • Air Force Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Blood Volume
  • Diffusion
  • Electric Vehicles
  • Electrodes
  • Electron Density
  • Electron Emission
  • Electrons
  • Elements
  • Emission
  • Ion Density
  • Ion Sources
  • Ions
  • Magnetic Fields
  • Mass Spectrometers
  • Measurement
  • Photoexcitation
  • Universities

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Plasma Physics / Magnetohydrodynamics
  • ballistics.

Technology Areas

  • Microelectronics