Quantitative Secondary Ion Mass Spectroscopy.

Abstract

This report describes in detail the use of the Cameca IMS-300 ion microscope for both quantitative analysis of sophisticated electronic devices and qualitative evaluation of ion implanted metals. The use of Secondary Ion Mass Spectroscopy (SIMS) in depth profiling adds a new dimension to surface analysis, enabling small concentrations of species which were previously undetectable to be determined. By being able to distinguish the differences in mass, isotopic techniques permit the elucidation of mechanisms which are responsible for the formation of wear resistant, low friction surfaces associated with titanium implantation into steels.

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Document Details

Document Type
Technical Report
Publication Date
Jul 01, 1983
Accession Number
ADA134195

Tags

Communities of Interest

  • Advanced Electronics
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Acquisition
  • Auger Electron Spectroscopy
  • Auger Electrons
  • Computer Programs
  • Computers
  • Current Density
  • Data Acquisition
  • Electron Spectroscopy
  • Ion Beams
  • Mass Spectrometry
  • Mass Spectroscopy
  • Partial Pressure
  • Spectra
  • Spectrometry
  • Spectroscopy
  • Steady State
  • Vacuum Chambers

Readers

  • Analytical Chemistry
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics