Environmental Durability of Aluminum Adhesive Joints Protected with Hydration Inhibitors.

Abstract

The adsorption of selected, organic, hydration inhibitors onto and the subsequent hydration of Forest Products Laboratory (FPL)-etched surfaces has been studied using X-ray photoelectron spectroscopy (XPS) and surface behavior diagrams (SBD's) supplemented by inelastic electron tunneling spectroscopy (IETS) and Fourier Transform Infrared Spectroscopy (FTIR). The results indicate that nitrilotris methylene phosphonic acid (NTMP) and related compounds adsorb to the alumina surface via the POH bonds of the phosphonic acid groups, resulting in a displacement of water normally adsorbed onto the surface. A model of adsorption was developed that suggests that at very low treatment solution concentrations (approx 1 ppm) only one leg of the NTMP molecule adsorbs onto the surface although at higher concentrations (approx 100 ppm) all three legs do. Hydration is a three-step process: 1) a reversible physisorption of water, 2) a slow dissolution of the inhibitor followed by a rapid hydration of the freshly exposed A1203 to boehmite A100H, and 3) a further hydration of the A100H to bayerite A1(0H)3. It is during the second step that bond failure occurs with the dissolution of the inhibitor being the rate limiting reaction. Analysis of the adsorption, hydration, and wedge tests results using different inhibitors suggests four criteria of an inhibitor to promote good bond performance: occupation of all active sites on the A1203 surface, strong inhibitor surface bonds, insolubility of the resulting inhibitor-aluminum complex in aqueous solutions, and compatibility with the adhesive/primer.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Nov 01, 1983
Accession Number
ADA135304

Entities

People

  • G. D. Davis
  • J. D. Venables
  • J. S. Ahearn

Organizations

  • Martin Marietta

Tags

Communities of Interest

  • Advanced Electronics
  • Air Platforms

DTIC Thesaurus Topics

  • Adhesives
  • Aluminum Oxides
  • Chemical Synthesis
  • Chemistry
  • Electrons
  • Materials
  • Measurement
  • Military Research
  • Organic Chemistry
  • Oxides
  • Phosphonic Acids
  • Phosphoric Acids
  • Quantum Numbers
  • Resistance
  • Spectra
  • Spectroscopy
  • Surface Chemistry

Readers

  • Analytical Chemistry
  • Electrochemical Engineering/ Fuel Cell Technologies
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics