Characterization of Crystallographic Structure and Internal Stress of Chromium Coatings Plated under Current Interruptions.

Abstract

The effect of interrupted current (IC) plating on the visual crack morphology, crystallography, and residual stresses of electrodeposited chromium has been investigated. Varying the process parameters such as the on/off plating cycle and current density resulted in changing the crystallographic fiber texture of the deposit from the conventional <111> orientation to a combination of <211>, <111>, and a small fraction of randomly oriented crystallites. Under these plating conditions, it was also found that (1) lower amounts of chromium hydride (CrHx) occur in the deposit, (2) a large decrease in the microcrack density of the deposit occurs, and (3) the deposits tend to become compressively stressed.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Sep 01, 1983
Accession Number
ADA136118

Entities

People

  • E. S. Chen
  • G. P. Capsimalis

Organizations

  • United States Army Armament Research, Development and Engineering Center

Tags

Communities of Interest

  • Weapons Technologies

DTIC Thesaurus Topics

  • Chromium
  • Coatings
  • Crystal Lattices
  • Crystal Structure
  • Crystallites
  • Crystallography
  • Crystals
  • Current Density
  • Diffraction
  • Electrodeposition
  • Mechanical Properties
  • Mechanics
  • Plating
  • Residual Stress
  • Stresses
  • X Rays
  • X-Ray Diffraction

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Semiconductor Device Technology
  • Structural Health Monitoring of Composite Structures.