Electrical Transport in Low Resistivity Amorphous Alloys

Abstract

Diffraction model calculations incorporating appropriate scattering matrix elements and phonon ineffectiveness effects (saturation effects) yield results which are consistent with the observed temperature dependence of the electrical resistivity in low resistivity (Rho < or = 100 micro ohms/cm) amorphous alloys. In particular, remarkably good quantitative agreement with available detailed resistivity measurements in a-MgZn alloys has been obtained by these methods. The results further indicate that saturation effects, which dominate the temperature dependence of the high resistivity amorphous metals, are important even for resistivities as low as 50 micro ohms/cm.

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Document Details

Document Type
Technical Report
Publication Date
Sep 01, 1983
Accession Number
ADA136331

Entities

People

  • Lawrence V. Meisel
  • Paul J. Cote

Organizations

  • United States Army Armament Research, Development and Engineering Center

Tags

Communities of Interest

  • Weapons Technologies

DTIC Thesaurus Topics

  • Agreements
  • Atomic Structure
  • Born Approximations
  • Classification
  • Diffraction
  • Elastic Scattering
  • Electrons
  • Experimental Data
  • Inelastic Scattering
  • Low Temperature
  • Mean Free Path
  • Measurement
  • Military Research
  • Phase Shift
  • Saturation
  • Scattering
  • Security

Fields of Study

  • Materials science
  • Physics

Readers

  • Materials Science and Engineering.