Laser Chemical Vapor Deposition.
Abstract
Metal, dielectric and semiconductor films have been deposited by laser chemical vapor deposition (LCVD) using both pulsed and cw laser sources on a variety of substrates. For LCVD on substrates such as quartz, the deposition was monitored optically in both transmission and reflection using a collinear visible laser and the depositing CO2 laser. Deposition initiation and rate were correlated with irradiation conditions, the laser generated surface temperature, and the changing optical properties of the film/substrate during deposition. Single crystallites of W greater than 100 micrometers tall were deposited using a Kr laser on Si substrates. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 20, 1983
- Accession Number
- ADA137827
Entities
People
- M. Bass
- S. D. Allen
Organizations
- University of Southern California