Pulsed D2-F2 Chain-Laser Damage to Coated Window and Mirror Components.

Abstract

Large-spot laser damage thresholds were measured for bowl-feed-polished CaF2 and sapphire windows (bare and antireflection-coated) and for highly polished copper mirrors (bare and carbyne-coated) at DF chain-laser wavelengths (3.58-4.78 micrometers). The chain reaction between F2 and D2 was initiated by a magnetically confined electron beam, producing DF-laser outputs of 10 to 20 J in pulses of 0.6 to 0.9 microseconds (FWHM) duration. Energy extracted from a transmission-coupled unstable resonator was focused by means of a CaF2 lens. A soft-aperture technique was employed to suppress effects of Fresnel diffraction so that uniform (top-hat) intensity profiles were obtained along the focusing beam. With this laser system, commercially available antireflection-coated CaF2 and Al2O3 samples were tested and found to have damage thresholds from 17 to 28 J/sq cm 2. Significantly larger damage thresholds were observed for uncoated, polished samples of Al2O3, but damage resistance of uncoated polished CaF2 was found to equal that of the best antireflection-coated CaF2 samples. A highly polished copper mirror had the highest damage threshold of all the materials tested, i.e., 58 J/sq cm 2.

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Document Details

Document Type
Technical Report
Publication Date
Dec 15, 1983
Accession Number
ADA138911

Entities

People

  • A. Chase
  • A. Whittaker
  • J. S. Whittier
  • R. Hofland Jr.
  • S. T. Amimoto

Organizations

  • The Aerospace Corporation

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies
  • Space

DTIC Thesaurus Topics

  • Air Force
  • Antireflection Coatings
  • Chain Reactions
  • Chemical Reactions
  • Coatings
  • Deuterium Fluoride Lasers
  • Diffraction
  • Electron Beams
  • Failure Mode And Effect Analysis
  • Laser Beams
  • Laser Damage
  • Lasers
  • Materials
  • Measurement
  • Optics
  • Radiation
  • Resistance

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Optical Physics and Photonics.
  • Pulsed Power and Plasma Physics.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene
  • Microelectronics - Microelectromechanical Systems