Synthesis and Evaluation of Improved Electron-Beam and X-Ray Lithographic Resist Polymers.
Abstract
It was the goal of this research to investigate the relationship between the chemical structure of polymers and the properties which would result in a new generation of lithographic resists for electron-beam and X-ray lithography. Thus, the synthesis of a variety of vinyl homopolymers, copolymers and terpolymers was undertaken where quaternary centers were present along the polymer backbone. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- May 01, 1984
- Accession Number
- ADA141674
Entities
People
- C. U. Pittman Jr.
Organizations
- University of Alabama